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KMID : 1059519950390100763
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Journal of the Korean Chemical Society
1995 Volume.39 No. 10 p.763 ~ p.768
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A Kinetic Model of the Nonphotochemical Hole Burning : 3-Level System
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Lee In-Ja
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Abstract
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The theory previously proposed to simulate hole depth in the weak burn intensity limit is extended to examine the hole depth at arbitrary burn intensity using 3-level system model. The hole spectrum simulated using constant fluence gives different hole depth for strong burn intensity while it gives same hole depth for weak burn intensity region. The calculated hole growth curves are compared with published experimental data for oxazine720 in glycerol and tetracene in MTHF glass.
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